METHOD FOR ADJUSTING LASER BEAM PITCH BY CONTROLLING OF MOVEMENT FOR BOTH GRID IMAGE AND A TILTING ANGLE OF A STAGE

摘要

PURPOSE: A method for adjusting a pitch of a laser beam is provided to adjust the pitch of the laser beam irradiated to an exposed surface of a substrate through a DMD(Digital Micro mirror Device) module by rotating a mask image. CONSTITUTION: A rotation angle is obtained by an operation process after a factor about a repeated pattern is defined based on the exposure parameter data. A grid image(12) rotated with the obtained rotation angel is produced by moving a stage.