| 摘要 |
A nonvolatile memory cell comprising a semiconductor substrate, a gate electrode formed on a surface of the semiconductor substrate with a gate insulation film interposed between them, a pair of impurity diffusion layers formed in a surface layer of the semiconductor substrate on both sides of the gate electrode, a channel region positioned in the surface layer of the semiconductor substrate between the pair of impurity diffusion layers, a charge storage layer formed on a surface of at least one impurity diffusion layer and along a side wall of the gate electrode, and a charge storage layer electrode laminated on the charge storage layer.
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