发明名称 Solution-based process for making inorganic materials
摘要 Disclosed embodiments provide a solution-based process for producing useful materials, such as semiconductor materials. One disclosed embodiment comprises providing at least a first reactant and a second reactant in solution and applying the solution to a substrate. The as-deposited material is thermally annealed to form desired compounds. Thermal annealing may be conducted under vacuum; under an inert atmosphere; or under a reducing environment. The method may involve using metal and chalcogen precursor compounds. One example of a metal precursor compound is a metal halide. Examples of suitable chalcogen precursor compounds include a chalcogen powder, a chalcogen halide, a chalcogen oxide, a chalcogen urea, a chalcogen or dichalcogen comprising organic ligands, or combinations thereof. Certain disclosed embodiments concern a method for making a solar cell from I-III-VI semiconductors.
申请公布号 US2010261304(A1) 申请公布日期 2010.10.14
申请号 US20100798755 申请日期 2010.04.09
申请人 STATE OF OREGON ACTING BY AND THROUGH THE STATE BOARD OF HIGHER EDUCATION ON BEHALF OF OREGON;STATE UNIVERSITY 发明人 CHANG CHIH-HUNG;WANG WEI
分类号 H01L31/18;H01L21/04;H01L51/46;H01L51/48 主分类号 H01L31/18
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