发明名称 |
EPOXY GROUP-CONTAINING ORGANOSILOXANE COMPOUND, CURABLE COMPOSITION FOR TRANSFER MATERIALS AND METHOD FOR FORMING MICROPATTERN USING THE COMPOSITION |
摘要 |
The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. A curable composition for transfer materials of the present invention contains a curable silicon compound produced by subjecting a silicon compound (A) having a Si—H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group to a hydrosilylation reaction.
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申请公布号 |
US2010258983(A1) |
申请公布日期 |
2010.10.14 |
申请号 |
US20080741148 |
申请日期 |
2008.11.05 |
申请人 |
SHOWA DENKO K.K. |
发明人 |
MORINAKA KATSUTOSHI;ARAI YOSHIKAZU;UCHIDA HIROSHI;FUJITA TOSHIO |
分类号 |
B29C35/08;B29C59/02;C08G77/14;C08L63/00 |
主分类号 |
B29C35/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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