发明名称 EPOXY GROUP-CONTAINING ORGANOSILOXANE COMPOUND, CURABLE COMPOSITION FOR TRANSFER MATERIALS AND METHOD FOR FORMING MICROPATTERN USING THE COMPOSITION
摘要 The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. A curable composition for transfer materials of the present invention contains a curable silicon compound produced by subjecting a silicon compound (A) having a Si—H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group to a hydrosilylation reaction.
申请公布号 US2010258983(A1) 申请公布日期 2010.10.14
申请号 US20080741148 申请日期 2008.11.05
申请人 SHOWA DENKO K.K. 发明人 MORINAKA KATSUTOSHI;ARAI YOSHIKAZU;UCHIDA HIROSHI;FUJITA TOSHIO
分类号 B29C35/08;B29C59/02;C08G77/14;C08L63/00 主分类号 B29C35/08
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