摘要 |
<p>PURPOSE: A pellicle detachment apparatus of a photo-mask is provided to prevent the contamination of a mask process progressing devices, and to extend the usage lifetime of the photo-mask. CONSTITUTION: A pellicle detachment apparatus of a photo-mask comprises the following: a mask loading unit(200) to settle the photo-mask attached with a pellicle formed with a pellicle film(110) and a frame(120); a clamp(210) coupled with the frame; and a rotary driving unit(220) detaching the pellicle with a constant speed using a stepping motor, transferring a fixed amount of force by rotating to the clamp.</p> |