发明名称 PELLICLE DE-MOUNTER OF PHOTOMASK
摘要 <p>PURPOSE: A pellicle detachment apparatus of a photo-mask is provided to prevent the contamination of a mask process progressing devices, and to extend the usage lifetime of the photo-mask. CONSTITUTION: A pellicle detachment apparatus of a photo-mask comprises the following: a mask loading unit(200) to settle the photo-mask attached with a pellicle formed with a pellicle film(110) and a frame(120); a clamp(210) coupled with the frame; and a rotary driving unit(220) detaching the pellicle with a constant speed using a stepping motor, transferring a fixed amount of force by rotating to the clamp.</p>
申请公布号 KR20100111132(A) 申请公布日期 2010.10.14
申请号 KR20090029538 申请日期 2009.04.06
申请人 HYNIX SEMICONDUCTOR INC. 发明人 SEO, KANG JOON
分类号 G03F1/62;H01L21/027 主分类号 G03F1/62
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