| 摘要 |
<P>PROBLEM TO BE SOLVED: To allow an integrated circuit device further inexpensively facilitating maintenance and management and high in performance by a dry photolithographic device achieving resolution surpassing that of a wet immersion photolithographic device because the immersion photolithographic device has the highest resolution now, but a system is complicated due to use of a liquid and it has various drawbacks. <P>SOLUTION: In this dry photolithographic device, an appropriate wavelength is set in a system, and a plurality of kinds of dry lens materials suitable for the wavelength and each having a refractive index higher than that of water (pure water) are used. Thereby, the resolution is enhanced, and the maintenance and management is further inexpensively facilitated. <P>COPYRIGHT: (C)2011,JPO&INPIT |
