发明名称 THIN-FILM TRANSISTOR, METHOD OF MANUFACTURING THE SAME, LIQUID CRYSTAL DISPLAY PANEL AND ELECTRONIC DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce a leakage current in a polysilicon TFT without increasing the number of processes. SOLUTION: Source and drain regions of active layers 22 of a thin-film transistor 20 are formed on a glass substrate 21 of a liquid crystal display panel 15 of a mobile phone and are mounted on a circuit region C and a pixel region P, respectively. The source and drain regions are formed so that an impurity concentration of boron is in a range from 2.5×10<SP>18</SP>/cm<SP>3</SP>to 5.5×10<SP>18</SP>/cm<SP>3</SP>and an activation ratio of the impurity is in a range from 1-7%. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010232231(A) 申请公布日期 2010.10.14
申请号 JP20090075281 申请日期 2009.03.25
申请人 NEC LCD TECHNOLOGIES LTD 发明人 SHIODA KUNIHIRO
分类号 H01L29/786;G02F1/1368;G09F9/30;H01L21/336 主分类号 H01L29/786
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