发明名称 |
THIN-FILM TRANSISTOR, METHOD OF MANUFACTURING THE SAME, LIQUID CRYSTAL DISPLAY PANEL AND ELECTRONIC DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To reduce a leakage current in a polysilicon TFT without increasing the number of processes. SOLUTION: Source and drain regions of active layers 22 of a thin-film transistor 20 are formed on a glass substrate 21 of a liquid crystal display panel 15 of a mobile phone and are mounted on a circuit region C and a pixel region P, respectively. The source and drain regions are formed so that an impurity concentration of boron is in a range from 2.5×10<SP>18</SP>/cm<SP>3</SP>to 5.5×10<SP>18</SP>/cm<SP>3</SP>and an activation ratio of the impurity is in a range from 1-7%. COPYRIGHT: (C)2011,JPO&INPIT
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申请公布号 |
JP2010232231(A) |
申请公布日期 |
2010.10.14 |
申请号 |
JP20090075281 |
申请日期 |
2009.03.25 |
申请人 |
NEC LCD TECHNOLOGIES LTD |
发明人 |
SHIODA KUNIHIRO |
分类号 |
H01L29/786;G02F1/1368;G09F9/30;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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地址 |
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