发明名称 METHOD FOR MANUFACTURING FLEXIBLE SEMICONDUCTOR DEVICE
摘要 There is provided a method for manufacturing a flexible semiconductor device. The manufacturing method is characterized by comprising (i) a step of forming an insulating film on the upper surface of a resin film, (ii) a step of forming a pattern of extraction electrodes on the upper surface of the resin film, (iii) a step of forming a semiconductor layer on the insulating film in such a manner that the semiconductor layer is in contact with the pattern of extraction electrodes, and (iv) a step of forming a sealing resin layer on the upper surface of the resin film in such a manner that the sealing resin layer covers the semiconductor layer and the pattern of extraction electrodes, wherein at least one forming step among the above (i) to (iv) is carried out by a printing method. In the manufacturing method, various layers can be formed by a simple printing process without using a vacuum process, photolithography, or the like.
申请公布号 US2010261321(A1) 申请公布日期 2010.10.14
申请号 US20090681399 申请日期 2009.07.30
申请人 HIRANO KOICHI;NAKATANI SEIICHI;OGAWA TATSUO 发明人 HIRANO KOICHI;NAKATANI SEIICHI;OGAWA TATSUO
分类号 H01L21/336 主分类号 H01L21/336
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