发明名称 |
METHODS OF FORMING AN AMORPHOUS CARBON LAYER AND METHODS OF FORMING A PATTERN USING THE SAME |
摘要 |
In a method of forming an ACL, a substrate is provided in a deposition chamber. A plasma deposition process is performed by providing a deposition gas into the deposition chamber to form the ACL on the substrate. The deposition gas includes a deposition source gas, a carrier gas and a control gas. The deposition source gas includes a hydrocarbon, and the control gas includes at least one of oxygen and oxycarbon.
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申请公布号 |
US2010258526(A1) |
申请公布日期 |
2010.10.14 |
申请号 |
US20100753939 |
申请日期 |
2010.04.05 |
申请人 |
WON JAIHYUNG;PARK JIN-HYUNG;LIM JEON-SIG;PARK JAE-HYUN;CHOI JONG-SIK |
发明人 |
WON JAIHYUNG;PARK JIN-HYUNG;LIM JEON-SIG;PARK JAE-HYUN;CHOI JONG-SIK |
分类号 |
C23F1/00;C23C16/44 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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