发明名称 ELECTRODE, METHOD FOR FORMING THE SAME, SEMICONDUCTOR SILICON WAFER, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electrode with satisfactory Schottky characteristic and high stability, in which Schottky junction used for evaluation of electric characteristics or the like can be easily formed, a method for forming the electrode, and the like. SOLUTION: The electrode Schottky-joined onto a semiconductor silicon wafer includes an Al base alloy containing one or more elements having physical properties such that work function is 4.0 eV or less. In the method for forming the electrode, the electrode is formed by vacuum deposition. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010232323(A) 申请公布日期 2010.10.14
申请号 JP20090076852 申请日期 2009.03.26
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 TOBE TOSHIMI
分类号 H01L29/47;H01L21/28;H01L21/66;H01L29/872 主分类号 H01L29/47
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