Optical arrangement i.e. projection illumination system, operating method for microlithography, involves illuminating lens with light, such that non-uniform temperature distribution is produced in lens to correct defect of system
摘要
<p>The method involves determining an image defect of a projection illumination system (1), and illuminating an optical lens of the illumination system with heating light by using a heating light source in such a manner that a non-uniform temperature distribution is produced in the optical lens for correcting the image defect of the illumination system. The illumination of the optical lens with the light takes place with constant or variable radiation power, where wavelength of the light is selected from infrared wavelength spectrum.</p>
