发明名称 METHOD OF MANUFACTURING DIELECTRIC FILM, METHOD OF MANUFACTURING PIEZOELECTRIC ELEMENT, AND METHOD OF MANUFACTURING LIQUID INJECTION HEAD
摘要 <P>PROBLEM TO BE SOLVED: To form a thin film by applying a raw material liquid onto a substrate in a state where an influence of secondary particles is eliminated. <P>SOLUTION: By a mesh member 67, shear stress larger than that applied by a nozzle (having a concept of including piping 65a) is applied to sol between the nozzle 65 and the substrate 64, and the sol is applied on the substrate 64 in a state where secondary particles produced in the sol are broken right before the substrate 64. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010232271(A) 申请公布日期 2010.10.14
申请号 JP20090075926 申请日期 2009.03.26
申请人 SEIKO EPSON CORP 发明人 TORIMOTO TATSURO;SUMI KOJI
分类号 H01L41/09;B41J2/045;B41J2/055;B41J2/135;B41J2/14;B41J2/16;H01L21/316;H01L41/18;H01L41/22;H01L41/318;H01L41/39 主分类号 H01L41/09
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