发明名称 ELECTRON BEAM IRRADIATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an electron beam irradiating apparatus which can decrease the usage of an inactive gas, due to its simple structure, without having to use special nitrogen gas chambers, or the like. SOLUTION: An irradiation space 21, where an electron beam irradiation treatment is given to an object to be treated, is included inside an irradiation chamber 20. An electron beam generated in an electron beam generating component 10 is extracted in the irradiation space 21 via an irradiation window 30. The object to be treated is conveyed by conveying equipment 40 so as to pass via the irradiation space 21; the irradiation space 21 is constituted as a space surrounded by the irradiation window 30, a beam catcher 50 for catching the electron beam that have passed through the irradiation space 21 and outer frames 210, placed approximately parallel to the irradiation direction of the electron beam, without preventing conveyance of the object to be treated. A gas supply component 60 makes the irradiation atmosphere in the irradiation space 21 into an inactive gas atmosphere, by supplying an inactive gas into the irradiation space 21 in the electron beam irradiation treatment. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010230536(A) 申请公布日期 2010.10.14
申请号 JP20090079215 申请日期 2009.03.27
申请人 IWASAKI ELECTRIC CO LTD 发明人 ITO MASAYOSHI;TAKEI TARO
分类号 G21K5/04;B01J19/12;B05C9/12;B05C15/00;G21K5/00;G21K5/10 主分类号 G21K5/04
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