| 摘要 |
PROBLEM TO BE SOLVED: To provide a level difference measuring method and a level difference measuring device, that can measure a difference in level such as an etching depth of a fine structure pattern. SOLUTION: A signal profile generation unit 35 generates profiles of a plurality of signal waveforms differing in focus position from a scanned image obtained by irradiating a fine pattern with an electron beam. A data processing unit 36 differentiates the generated profiles of the signal waveforms to generate a differential profile. A data analysis unit 38 extracts differential peak values corresponding to an upper layer part and a lower layer part of the pattern from the generated differential profiles, and stores them together with focus positions. Further, a data analysis unit 38 generates a relational chart between the differential peak values and focus positions, and calculates a difference in level of the fine pattern from the relational chart. COPYRIGHT: (C)2011,JPO&INPIT |
