发明名称 OBLIQUE MIRROR-TYPE NORMAL-INCIDENCE COLLECTOR SYSTEM FOR LIGHT SOURCES, PARTICULARLY EUV PLASMA DISCHARGE SOURCES
摘要 There is provided a collector system. The collector system includes a first collector mirror and a second collector mirror. The first collector mirror receives EUV light from a light source at a first aperture angle via a first beam path, and reflects the EUV light at a second aperture angle along a second beam path. The first aperture angle is larger than or substantially equal to the second aperture angle. The second mirror receives the EUV light from the first mirror at the second aperture angle. The collector is an oblique mirror type normal incidence mirror collector system.
申请公布号 US2010259742(A1) 申请公布日期 2010.10.14
申请号 US20100823403 申请日期 2010.06.25
申请人 CARL ZEISS SMT AG 发明人 SINGER WOLFGANG
分类号 G03B27/54;G02B5/08;G03B27/32;G03F7/20;G11C11/22 主分类号 G03B27/54
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