发明名称 |
FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER READABLE STORAGE MEDIUM |
摘要 |
A rotation table on which a wafer is placed is rotated around a vertical axis in order to supply to an upper surface of the wafer a first reaction gas for allowing the first reaction gas to be adsorbed on the upper surface, an auxiliary gas that reacts with the first reaction gas to produce an intermediate product having reflowability, and a second reaction gas that is reacted with the intermediate product to produce a reaction product in this order; and the reaction product is heated by a heating lamp in order to densify the reaction product.
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申请公布号 |
US2010260935(A1) |
申请公布日期 |
2010.10.14 |
申请号 |
US20100753932 |
申请日期 |
2010.04.05 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KATO HITOSHI;HONMA MANABU;KIKUCHI HIROYUKI |
分类号 |
C23C16/52;C23C16/00;C23C16/46 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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