发明名称 |
PROCESS AND APPARATUS FOR REMOVAL OF CONTAMINATING MATERIAL FROM SUBSTRATES |
摘要 |
A process for removing contaminating metals from a substrate to improve electrical performance is provided. Polycationic metals are known to be particularly detrimental to the electrical properties of an insulator or semiconductor substrate. The process includes the exposure of the substrate to an aqueous solution of at least one compound of the formula: (I) where n in each occurrence is independently an integer value between 0 and 6, and X is independently in each occurrence H, NR4, Li, Na or K and at least one of X is NR4; where R in each occurrence is independently H or C1-C6 alkyl, to improve electrical performance of the substrate. A kit for preparing such a solution includes a 1-20 total weight percent aqueous concentrate of at least one compound of formula (I). The kit also provides instructions for the dilution of the concentrate to form the solution. |
申请公布号 |
WO2010118206(A2) |
申请公布日期 |
2010.10.14 |
申请号 |
WO2010US30349 |
申请日期 |
2010.04.08 |
申请人 |
SUNSONIX;TREICHEL, HELMUTH;BOHLING, DAVE;FARBER, JEFF |
发明人 |
TREICHEL, HELMUTH;BOHLING, DAVE;FARBER, JEFF |
分类号 |
C11D7/32;G03F7/42 |
主分类号 |
C11D7/32 |
代理机构 |
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代理人 |
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地址 |
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