| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide photomask blanks having high sensitivity and high storage stability, and a photomask that is prepared using the photomask blanks, has high resolution, and has high linearity of an image edge. <P>SOLUTION: The photomask blanks include, in the following order, a photosensitive composition layer containing on a substrate (A) sensitizing pigment, (B) polymerization initiator, (C) ethylenic unsaturated compound, (D) binder polymer, and (E) light shielding material, and an oxygen shielding layer containing polyvinyl alcohol derivative containing polyoxyalkylene group in a side chain. The photomask is prepared using the photomask blanks. <P>COPYRIGHT: (C)2011,JPO&INPIT |
