| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a coil for a plasma treatment device, wherein a uniform plasma density can be achieved on a workpiece in a vacuum plasma chamber. <P>SOLUTION: The coil 170 for the plasma treatment device includes a first excitation terminal 188 and second excitation terminal 190 to be connected to the first and second terminals on both sides of an RF excitation circuit. A winding 172 is connected to the first excitation terminal 188, a winding 174 is connected to the second excitation terminal 190, and a short circuit winding 186 is coupled with the winding 172 and the winding 174. <P>COPYRIGHT: (C)2011,JPO&INPIT |
