发明名称 |
Methods, Photomasks and Methods of Fabricating Photomasks for Improving Damascene Wire Uniformity Without Reducing Performance |
摘要 |
A method of improving damascene wire uniformity without reducing performance. The method includes simultaneously forming a multiplicity of damascene wires and a multiplicity metal dummy shapes in a dielectric layer of a wiring level of an integrated circuit chip, the metal dummy shapes dispersed between damascene wires of the multiplicity of damascene wires; and removing or modifying those metal dummy shapes of the multiplicity of metal dummy shapes within exclusion regions around selected damascene wires of the multiplicity of damascene wires. Also a method of fabricating a photomask and a photomask for use in improving damascene wire uniformity without reducing performance.
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申请公布号 |
US2010261095(A1) |
申请公布日期 |
2010.10.14 |
申请号 |
US20090622461 |
申请日期 |
2009.11.20 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
GRANT CASEY JON;HANKEY JUDE L. |
分类号 |
G03F1/00;G03F7/20;G06F17/50;H01L21/3205 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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