发明名称 SILICON-BASED DIELECTRIC STACK PASSIVATION OF SI-EPITAXIAL THIN-FILM SOLAR CELLS
摘要 One embodiment of the present invention provides a solar cell. The solar cell includes a metallurgical-grade Si (MG-Si) substrate, a first layer of heavily doped crystalline-Si situated above the MG-Si substrate, a layer of lightly doped crystalline-Si situated above the first heavily doped crystalline-Si layer, a backside ohmic-contact layer situated on the backside of the MG-Si substrate, a second layer of heavily doped crystalline-Si situated above the lightly doped crystalline-Si layer, a first layer of dielectric situated above the second heavily doped crystalline-Si layer, a second layer of dielectric situated above the first dielectric layer, and front electrodes situated above the second dielectric layer.
申请公布号 US2010258168(A1) 申请公布日期 2010.10.14
申请号 US20090421470 申请日期 2009.04.09
申请人 SIERRA SOLAR POWER, INC. 发明人 YU CHENTAO;FU JIANMING;HENG JIUNN BENJAMIN
分类号 H01L31/00;H01L31/18 主分类号 H01L31/00
代理机构 代理人
主权项
地址