发明名称 NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a negative photosensitive lithographic printing plate developable with a chemical-free developing solution and improved in ink receptivity. <P>SOLUTION: The negative photosensitive lithographic printing plate comprises a photosensitive layer containing a photo-radial generator and a water-soluble polymer, which has a vinyl-substituted phenyl group and is soluble with an aqueous solution having a pH equal to or less than 10, on a support, wherein the photosensitive layer further contains a compound comprising at least two structures expressed by general formula 1. In general formula 1, R<SB>1</SB>represents a hydrogen atom, a halogen atom or an alkyl group; and R<SB>2</SB>represents a hydrogen atom, halogen atom, an alkyl, unsaturated alkyl, aryl, heterocyclic, alkoxy, aryloxy, acyl, amino, hydroxyl, amide, mercapto, sulfo or cyano group. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010230715(A) 申请公布日期 2010.10.14
申请号 JP20090075104 申请日期 2009.03.25
申请人 MITSUBISHI PAPER MILLS LTD 发明人 HAGIWARA TAKAHIRO;SEIYAMA HIDEO
分类号 G03F7/027;C08F290/14;C08G61/02;G03F7/00;G03F7/038 主分类号 G03F7/027
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