发明名称 SUPPORT DEVICE AND SUPPORT PROGRAM FOR ANALYZING OPERATING HISTORY OF SUBSTRATE PROCESSING DEVICE, AND RECORDING MEDIUM
摘要 <p><P>PROBLEM TO BE SOLVED: To facilitate the analysis of operating history in a substrate processing device applying a predetermined treatment to a substrate with a plurality of continuous operations. <P>SOLUTION: In a support device 100 for analyzing operating history of a substrate processing device, a log showing operating history formed by the substrate processing device is acquired by a log acquisition means 151, the history of states of the substrate processing device, the states having changed in time sequence, is specified based on the log by a means 152 for creating state history information, and the state history information showing the history of the states of the substrate processing device in accordance with time in a predetermined period is created. A plurality of simulated images are displayed on a display device as moving images in time sequence by a display control means 154 based on the state history information, wherein the simulated images correspond to a plurality of states of the substrate processing device in a period after a specific time specified by specified information acquired by a means 153 for acquiring specified information. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2010232405(A) 申请公布日期 2010.10.14
申请号 JP20090077969 申请日期 2009.03.27
申请人 TOKYO ELECTRON LTD 发明人 KOBAYASHI KENICHI
分类号 H01L21/02;G05B19/418 主分类号 H01L21/02
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