| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam lithography method in which drawing of a fine pattern can be made in high precision as prescribed on all surface of a substrate, and in a deflection control by a triangular wave deflection signal, drawing operation by electron beams is corrected and a photosensitized drawing of a prescribed element shape can be made rapidly and precisely with a constant dose. SOLUTION: When, by controlling irradiation timing of electron beams EB by an output of an On/Off signal to a blanking means 24 and controlling the deflection operation of the electron beams EB by the output of a triangular wave deflection signal to a beam deflection means 22, drawing is made by scanning the element shape so as to paint it on a substrate 10 on which a resist 11 is coated, the On/Off signal is established so that the beam irradiation time by the operation of the blanking means may be short to the reference drawing time, and a triangular wave correction in which the amplitude of the triangular wave deflection signal is established large in inverse proportion to the shortening ratio of the beam irradiation time is carried out to make drawing. COPYRIGHT: (C)2011,JPO&INPIT
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