发明名称 SEMICONDUCTOR NANOWIRE WITH BUILT-IN STRESS
摘要 <p>PURPOSE: A semiconductor nano wire with built-in stress is provided to improve an on-current and charge carrier mobility of a semiconductor nano wire transistor. CONSTITUTION: A semiconductor nano wire with built-in stress includes a semiconductor nano wire(32C) and a gate dielectric. The semiconductor nano wire is contacted with a first semiconductor pad(32A) and a second semiconductor pad(32B) and receives stress in a longitudinal direction. The gate dielectric surrounds the central part of the semiconductor nano wire to receive the stress. A dielectric material layer includes a first semiconductor pad and a second semiconductor pad and is stress-free.</p>
申请公布号 KR20100110727(A) 申请公布日期 2010.10.13
申请号 KR20100025421 申请日期 2010.03.22
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHIDAMBARRAO DURESETI;LIU XIAO HU;SEKARIC LIDIJA
分类号 H01L29/78;B82B1/00 主分类号 H01L29/78
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