发明名称 |
SEMICONDUCTOR NANOWIRE WITH BUILT-IN STRESS |
摘要 |
<p>PURPOSE: A semiconductor nano wire with built-in stress is provided to improve an on-current and charge carrier mobility of a semiconductor nano wire transistor. CONSTITUTION: A semiconductor nano wire with built-in stress includes a semiconductor nano wire(32C) and a gate dielectric. The semiconductor nano wire is contacted with a first semiconductor pad(32A) and a second semiconductor pad(32B) and receives stress in a longitudinal direction. The gate dielectric surrounds the central part of the semiconductor nano wire to receive the stress. A dielectric material layer includes a first semiconductor pad and a second semiconductor pad and is stress-free.</p> |
申请公布号 |
KR20100110727(A) |
申请公布日期 |
2010.10.13 |
申请号 |
KR20100025421 |
申请日期 |
2010.03.22 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHIDAMBARRAO DURESETI;LIU XIAO HU;SEKARIC LIDIJA |
分类号 |
H01L29/78;B82B1/00 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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