| 发明名称 |
Polishing composition, manufacturing thereof and polishing method |
| 摘要 |
<p>A polishing compound containing cocoon-shaped silica particles and crystal silica particles, and water-soluble polymers including; at least one type selected from the groups including ammonium nitrate and ammonium acetate, and at least one type selected from methylcellulose, carboxymethylcellulose, hydroxyethylcellulose, and the group including carboxymethylcellulose.</p> |
| 申请公布号 |
EP1174483(B1) |
申请公布日期 |
2010.10.13 |
| 申请号 |
EP20010306174 |
申请日期 |
2001.07.18 |
| 申请人 |
RODEL NITTA CORPORATION;ADMATECHS CO., LTD. |
发明人 |
SHIMAMOTO, HAJIME;ICHIKAWA, SHOJI;KONDO, KATSUMI;ABE, SUSUMU;TAKENOUCHI, KENJI |
| 分类号 |
C09K3/14;B01D61/14;B01D63/02;B24B37/00;C09G1/02;H01L21/304 |
主分类号 |
C09K3/14 |
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