发明名称 ELECTROLYTIC METHOD FOR FILLING HOLES AND CAVITIES WITH METALS
摘要 <p>Disclosed is an electroplating method for filling cavities, through holes, blind holes, or micro blind holes of a work piece with metals. According to said method, the work piece containing cavities, through holes, blind holes, or micro blind holes is brought in contact with a metal deposition electrolyte, and a voltage is applied between the work piece and at least one anode such that a current flow is fed to the work piece. The invention method is characterized in that the electrolyte encompasses a redox system.</p>
申请公布号 EP2000013(B1) 申请公布日期 2010.10.13
申请号 EP20070723814 申请日期 2007.03.30
申请人 ATOTECH DEUTSCHLAND GMBH 发明人 REENTS, BERT;ROELFS, BERND;MAGAYA, TAFADZWA;YOUKHANIS, MARKUS;WENZEL, RENE;KIM, SOUNGSOO
分类号 H05K3/42;C25D3/00;C25D5/00;H05K3/18 主分类号 H05K3/42
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