Device and method for plasma-supported surface modification of substrates in a vacuum

摘要

The apparatus has two electrodes (1,2), where three power supply contacts (3a,3b,4) are designed at one electrode for supplying electric voltage. Two power supply contacts are arranged in an axial direction with the greatest length at the outer edge or the edge area. The third power supply contact is arranged between the two power supply contacts, and is formed on the side of the former electrode turned away from the latter electrode. An independent claim is also included for a method for plasma-assisted surface modification of substrates in a vacuum.