发明名称 |
Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle |
摘要 |
A reticle has a mask substrate, a test pattern established on the mask substrate having an asymmetrical diffraction grating so as to generate positive first order diffracting light and negative first order diffracting light in different diffraction efficiencies, and a device pattern adjacent to the test pattern established on the mask substrate. |
申请公布号 |
US7812972(B2) |
申请公布日期 |
2010.10.12 |
申请号 |
US20080230269 |
申请日期 |
2008.08.27 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
SATO TAKASHI;ASANO MASAFUMI;KANAI HIDEKI |
分类号 |
G01B11/30;G03F1/08;G01B11/00;G01B11/14;G01B11/24;G01B11/25;G01M11/02;G03F1/14;G03F1/26;G03F1/60;G03F1/68;G03F7/20;G03F7/207;G03F9/00;H01L21/027 |
主分类号 |
G01B11/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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