发明名称 |
COMPOSITION HAVING UREA GROUP FOR FORMING SILICON-CONTAINING RESIST UNDERLYING FILM |
摘要 |
There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography comprising: a hydrolyzable organosilane having a urea group; a hydrolysis product thereof; or a hydrolysis-condensation product thereof. The hydrolyzable organosilane is for example a compound of Formula (1): where at least one of three groups T1, T2, and T3 is a group of Formula (2): |
申请公布号 |
KR20100109947(A) |
申请公布日期 |
2010.10.11 |
申请号 |
KR20107017387 |
申请日期 |
2009.01.08 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
NAKAJIMA MAKOTO;KANNO YUTA;SHIBAYAMA WATARU |
分类号 |
G03F7/11;C08G77/26;G03F7/40;H01L21/027 |
主分类号 |
G03F7/11 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|