METHOD FOR DETERMINATION OF SURFACE ROUGHNESS AND DEPTH OF DISTORTION OF CRYSTALLINE STRUCTURE OF MECHANICALLY PROCESSED PLATES OF SILICON

摘要

In the method for determination of roughness of surface and depth of distortions of crystalline structure of mechanically processed silicon plates one illuminates the sample with light with registration of characteristics of part of radiation reflected by the sample. Registration is performed in area of transparency of silicon with infrared radiation with wavelengths 1.3-27 mkm. Roughness of surface and depth of distortion of crystalline structure are determined by value of long-wave boundary of noise density of light reflected from the sample.