发明名称 FLOW RATE CONTROLLING APPARATUS USING GAS PRESSURE CONTROL IN LIQUID MATERIAL SUPPLYING APPARATUS
摘要 PURPOSE: A flow rate control apparatus using gas pressure adjustment in a liquid material supply apparatus is provided to accurately control the internal pressure of a liquid material container. CONSTITUTION: A flow rate control apparatus using gas pressure adjustment in a liquid material supply apparatus comprises a flow rate controller(7) and a manometer(8). The flow rate controller is installed in a gas supply pressure pipe(4) installed in the inlet side of a material container(2). The manometer is installed in a material supply pipe(5) installed between the material container and a process chamber(3). The flow rate controller compares the set pressure transmitted from an equipment control part(1) and the material supply pressure detected by the manometer and controls to equalize the two pressures. A bypass valve(41) is installed in the backend of the flow rate controller and bypasses the gas of the material container to outside when the internal pressure of the material container is over the set pressure.
申请公布号 KR20100108690(A) 申请公布日期 2010.10.08
申请号 KR20090026820 申请日期 2009.03.30
申请人 LEE, DUG GYU 发明人 LEE, DUG GYU
分类号 B67D7/72;G05D7/06 主分类号 B67D7/72
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