| 摘要 |
PURPOSE: An active ray sensitive or radiation sensitive resin composition, a resist film, and a pattern formation method using thereof are provided to secure the high-sensitivity and resolution for an electronic beam and EUV line lithography. CONSTITUTION: An active ray sensitive or radiation sensitive resin composition contains the following: a resin including a recurring unit containing a radical capable of forming acid by being disassembled when irradiating active rays or radioactive rays, a recurring unit containing a radical capable of forming carboxylic acid by being disassembled with the acid, and a recurring unit containing a carbon-carbon unsaturated bond; and a solvent with the boiling point lower than 150 deg C. |
