METHOD FOR INSPECTING PHOTOMASK BLANK OR INTERMEDIATE THEREOF, METHOD FOR DETERMINING DOSAGE OF HIGH-ENERGY RADIATION, AND METHOD FOR MANUFACTURING PHOTOMASK BLANK

摘要

PURPOSE: A photomask blank or manufacturing assembly inspection method, high energy beam irradiation energy determination method, and a photomask blank manufacturing method are provided to accurately estimate the stress of the photomask blank or a phase shift film of photomask blank manufacturing intermediate work. CONSTITUTION: After substrate forming adjustment is processed, the surface shape of a photomask blank(102) or a work in manufacturing process is measured. The surface shape of the processed substrate with the shift film removed is measured. The invention measures the variation of bending states of before and after the phase shift film is removed.