| 摘要 |
PURPOSE: A rotary plating device is provided to reduce plating costs and to increase productivity by partially plating a plating target by selectively emitting plating liquid to the appointed area of a plating target. CONSTITUTION: A rotary plating device comprises a rotary drum(10), a jet block, a plating liquid feeding unit, support unit(40) and a guide unit(50). The rotary drum is located to be contacted with a carrier and rotates along with the carrier. The jet block is rotated with the rotary drum. The jet block emits plating liquid to the appointed area of the plating target of the carrier. The plating liquid feeding unit supplies plating liquid to the jet block to in a radial direction.
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