发明名称 METHOD FOR FABRICATING THIN FILM CAPACITOR
摘要 The present invention relates to a method for fabricating a thin film capacitor. More particularly, the present invention relates to a thin film capacitor comprising a lower electric layer, a dielectric layer and an upper electric layer, wherein a metal ink imprint includes an organic metal complex, the lower electric layer, and the upper electric layer as essential components and is formed by being printed or coated. According to the present invention, a high quality thin film capacitor can be fabricated due to high improvement in the interface characteristics between an electric layer and a dielectric layer. Furthermore, mass production of a thin film capacitor can be accomplished with low costs because a roll-to-roll solution printing process can be applied to a manufacturing process.
申请公布号 WO2010114301(A2) 申请公布日期 2010.10.07
申请号 WO2010KR01969 申请日期 2010.03.31
申请人 INKTEC CO., LTD.;CHUNG, KWANG CHOON;CHO, HYUN-NAM;CHO, NAM-BOO;YOO, JI HOON 发明人 CHUNG, KWANG CHOON;CHO, HYUN-NAM;CHO, NAM-BOO;YOO, JI HOON
分类号 H01G9/016;H01G9/00 主分类号 H01G9/016
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