发明名称 NITRIDE-BASED SEMICONDUCTOR ELEMENT AND PRODUCTION METHOD THEREFOR
摘要 <p>A nitride-based semiconductor element (100) is provided with a GaN substrate (10), which has an m-plane (12) surface; a semiconductor layered structure (20) formed on the m-plane (12) of the GaN substrate (10), and an electrode (30) formed on the semiconductor layered structure (20). The electrode (30) includes a Mg layer (32) and a Ag layer (34) formed on the Mg layer (32). The Mg layer (32) connects to the p-type semiconductor region of the semiconductor layered structure (20).</p>
申请公布号 WO2010113405(A1) 申请公布日期 2010.10.07
申请号 WO2010JP01920 申请日期 2010.03.17
申请人 PANASONIC CORPORATION;OYA, MITSUAKI;YOKOGAWA, TOSHIYA;YAMADA, ATSUSHI;ISOZAKI, AKIHIRO 发明人 OYA, MITSUAKI;YOKOGAWA, TOSHIYA;YAMADA, ATSUSHI;ISOZAKI, AKIHIRO
分类号 H01L21/28;H01L33/32;H01L33/40 主分类号 H01L21/28
代理机构 代理人
主权项
地址