摘要 |
<P>PROBLEM TO BE SOLVED: To provide photodiodes and photodiode arrays that are silicon photodiodes and silicon photodiode arrays and have sufficient spectral sensitivity characteristics in near-infrared wavelength bands. <P>SOLUTION: A P<SP>-</SP>-type semiconductor substrate 20 includes first and second main surfaces 20a, 20b opposing each other, and a light sensitive region 21. The light sensitive region 21 includes an N<SP>+</SP>-type impurity region 23, a P<SP>+</SP>-type impurity region 25, and a region depleted when a bias voltage is applied in the P<SP>-</SP>-type semiconductor substrate 20. Irregularities 10 are formed on the second main surface 20b of the P<SP>-</SP>-type semiconductor substrate 20. An accumulation layer 37 is formed at the side of the second main surface 20b of the P<SP>-</SP>-type semiconductor substrate 20. A region opposite to the light sensitive region 21 in the accumulation layer 37 is exposed optically. <P>COPYRIGHT: (C)2011,JPO&INPIT |