| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a pattern providing good resolution, line edge roughness and the like. <P>SOLUTION: Provided is a chemically amplified type photoresist composition which contains an acid generator, and resins (A1) and (A2), wherein the resins (A1) and (A2) are obtained from acrylic monomers (a1), (a2), (a3), the weight average molecular weight of the resin (A1) is smaller than that of the resin (A2), and the resins satisfy following expressions: 0.995<S<SP>1</SP>/T<SP>1</SP><1.005, 0.995<S<SP>2</SP>/T<SP>2</SP><1.005, and 0.995<S<SP>3</SP>/T<SP>3</SP><1.005. The monomer (a1) includes a 6-20C saturated cyclic hydrocarbon group, which is made alkali-soluble by the action of an acid, the monomer (a2) includes an adamantyl group substituted with a hydroxyl group; and the monomer (a3) includes a lactone ring. In the expressions, S<SP>1</SP>, S<SP>2</SP>, S<SP>3</SP>each represent a charge amount (mol) of the monomers (a1), (a2), (a3), based on 100 mol of the charge amount of the resin (A1), and T<SP>1</SP>, T<SP>2</SP>, T<SP>3</SP>each represent a charge amount (mol) of the monomers (a1), (a2), (a3), based on 100 mol of the charge amount of the resin (A2). <P>COPYRIGHT: (C)2011,JPO&INPIT |
