发明名称 METHOD AND DEVICE FOR CHARACTERIZING SILICON LAYER ON TRANSLUCENT SUBSTRATE
摘要 A method for the characterization of a silicon layer on a translucent substrate, in particular, for the characterization of a solar cell blank, includes detecting by at least one optical detector, the light transmitted through the silicon layer and/or reflected on the silicon layer. The method also includes determining a degree of absorption of the silicon layer for at least one wavelength by means of the detected light. The method further includes determining a quantity ratio between an amorphous fraction and a crystalline fraction of the silicon layer or between one of these fractions and the total of these fractions by means of the degree of absorption.
申请公布号 US2010253942(A1) 申请公布日期 2010.10.07
申请号 US20100727802 申请日期 2010.03.19
申请人 CARL ZEISS MICROIMAGING GMBH 发明人 MACK KONRAD;GOBEL JUERGEN;WAGNER JOERG
分类号 G01J3/28;G01N21/00 主分类号 G01J3/28
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