| 发明名称 |
Methods of Patterning Substrates Using Microcontact Printed Polymer Resists and Articles Prepared Therefrom |
| 摘要 |
The present invention is directed to methods for patterning substrates using contact printing to form patterns comprising a polymer, using the patterns formed therefrom as resists, and process products formed by the process.
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| 申请公布号 |
US2010252955(A1) |
申请公布日期 |
2010.10.07 |
| 申请号 |
US20100752540 |
申请日期 |
2010.04.01 |
| 申请人 |
NANO TERRA INC.;MERCK PATENT GMBH |
发明人 |
AGARWAL SANDIP;MAYERS BRIAN T.;MCLELLAN JOSEPH M.;KUEGLER RALF;KURSAWE MONIKA |
| 分类号 |
B29C59/02;C08L25/08;C08L33/12;C08L37/00;C08L39/00;C08L41/00;C08L55/00 |
主分类号 |
B29C59/02 |
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