A PHOTOSENSITIVE COMPOSITION

摘要

The present invention relates to a novel photosensitive composition comprising a) an organic polymer, b) a photobase generator of structure (1 ), and c) optionally a photoacid generator, (+A1 -O2C)-B-(CO2 -A2 +)x where A1 + and A2 + are independently an onium cation, x is an integer greater than or equal to 1, and B is a nonfluorinated hydrocarbon moiety. The photosensitive composition may be used as a photoresist composition or be used as an alkali developable antireflective underlayer coating composition.