| 摘要 |
<p>Provided is an exposure method wherein, after exposure of the first exposure region (9) of a subject to be exposed (8) is completed using the first mask pattern group (12) of a photomask (11), which is formed by arranging at predetermined intervals a plurality of kinds of mask pattern groups corresponding to exposure patterns in the transfer direction of the subject to be exposed (8), while transferring the subject to be exposed (8) in the arrow A direction, the mask pattern group is switched from the first mask pattern group (12) to the second mask pattern group (13) by moving the photomask (11) in synchronization with the transfer speed of the subject to be exposed. Then, when the switching of the mask pattern group of the photomask (11) is completed, moving of the photomask (11) is stopped, exposure of the second exposure region (10) of the subject to be exposed (8) is performed by means of the second mask pattern group (13), and exposure patterns (24, 25) different for each of the exposure regions set at the predetermined intervals in the transfer direction of the subject to be exposed (8) are formed. Thus, efficiency of forming a plurality of kinds of exposure patterns on the same subject to be exposed is improved.</p> |
