<p>Disclosed herein are various embodiments related to metal-assisted chemical etching of substrates on the micron, sub-micron and nano scales. In one embodiment, among others, a method for metal-assisted chemical etching includes providing a substrate; depositing a non-spherical metal catalyst on a surface of the substrate; etching the substrate by exposing the non-spherical metal catalyst and the substrate to an etchant solution including a composition of a fluoride etchant and an oxidizing agent; and removing the etched substrate from the etchant solution.</p>
申请公布号
WO2010114887(A1)
申请公布日期
2010.10.07
申请号
WO2010US29370
申请日期
2010.03.31
申请人
GEORGIA TECH RESEARCH CORPORATION;HILDRETH, OWEN;WONG, C.P.;XIU, YONGHAO