发明名称 METHOD FOR FORMING GATE STRUCTURES
摘要 A process for forming gate structures is described. A web comprises a substrate, a plurality of conductive elements disposed on the substrate, and a conductive anodization bus. The web is moved through an anodization station to form a plurality of gate structures comprising a plurality of gate dielectrics adjacent to a plurality of gate electrodes. A process for forming electronic devices further providing a semiconductor, a source electrode, and a drain electrode is described.
申请公布号 US2010252176(A1) 申请公布日期 2010.10.07
申请号 US20080665094 申请日期 2008.05.20
申请人 TOKIE JEFFREY H;HAASE MICHAEL A;SCHUBERT ROBERT J;BENCH MICHAEL W;MCCLURE DONALD J;HO GRACE L 发明人 TOKIE JEFFREY H.;HAASE MICHAEL A.;SCHUBERT ROBERT J.;BENCH MICHAEL W.;MCCLURE DONALD J.;HO GRACE L.
分类号 C25D7/00;C25D11/02 主分类号 C25D7/00
代理机构 代理人
主权项
地址