| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device manufacturing method for forming an alignment mark which attains precise detection without affecting device performance. <P>SOLUTION: The device manufacturing method at least includes a process for forming a lamination film where a first film on the side of an upper layer is constituted of a material having resistance against etching with respect to a second film on the side of a lower layer, a process for patterning the first film in an element forming region and an alignment mark forming region, a process for protecting at least a region excluding a part close to the patterned first film in the alignment mark forming region with the use of a material having resistance against etching with respect to the second film, and an etching process for selectively etching the second film with the patterned first film as a mask. The step of the alignment mark constituted of the first film is increased by digging the circumference of the patterned first film. <P>COPYRIGHT: (C)2011,JPO&INPIT |
