APPARATUS AND METHOD FOR DEPOSITING FILM AND METHOD FOR ADJUSTING FREQUENCY

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and a method for depositing a film, in each of which the surface of an element can be prevented from being damaged and to provide methods for adjusting the frequency of a surface acoustic wave element and a surface acoustic wave filter. SOLUTION: A magnetic field generation part 4 for generating a magnetic field to change the direction of an ion beam IB and a magnetic field control part 5 for controlling the direction and strength of the magnetic field to irradiate an optional irradiation area IBA of a material source 6 with the ion beam IB are arranged between an ion gun 3 and the material source (a target 6). COPYRIGHT: (C)2011,JPO&INPIT