| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning device capable of improving a uniformity of particle removal on a surface of a substrate. SOLUTION: The substrate cleaning device 1 includes: a processing tank 10 for storing process liquid; a lifter 20 having a substrate-holder 21 for holding a substrate W and lifting and lowering the substrate; a propagation tank 30 for storing propagation liquid; an ultrasonic transducer 31 provided on a bottom of the propagation tank 30; and a distribution generator 80. Variations in cavitation on the surface of the substrate on the opposite side of the distribution generator 80 in which an ultrasonic vibration is applied, can be suppressed by arranging the distribution generator 80 between the ultrasonic transducer 31 and the substrate W immersed in the processing tank 10. Accordingly, the uniformity of particle removal on the surface of the substrate W can be improved. COPYRIGHT: (C)2011,JPO&INPIT |
