发明名称 |
CONFORMAL PHOTO-SENSITIVE LAYER AND PROCESS |
摘要 |
The present disclosure provides a method for etching a substrate. The method includes forming a patterned photo-sensitive layer on the substrate; applying an etching chemical fluid to the substrate, wherein the patterned photo-sensitive layer includes an adhesion promoter and/or hydrophobic additive; removing the etching chemical fluid; and removing the resist pattern.
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申请公布号 |
US2010255427(A1) |
申请公布日期 |
2010.10.07 |
申请号 |
US20100751250 |
申请日期 |
2010.03.31 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
WANG CHIEN-WEI;HUANG VICTOR;CHANG CHING-YU |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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