发明名称 |
Plasma Generation Method, Cleaning Method, and Substrate Processing Method |
摘要 |
A plasma generation method in a toroidal plasma generator that includes a gas passage having a gas entrance and a gas outlet and forming a circuitous path and a coil wound around a part of the gas passage includes the steps of supplying a mixed gas of an Ar gas and an NF3 gas containing at least 5% of NF3 and igniting plasma by driving the coil with a high-frequency power, wherein the plasma ignition step is conducted under a total pressure of 6.65-66.5 Pa.
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申请公布号 |
US2010252068(A1) |
申请公布日期 |
2010.10.07 |
申请号 |
US20100752813 |
申请日期 |
2010.04.01 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KANNAN HIROSHI;TAMURA NOBORU;DOBASHI KAZUYA |
分类号 |
B08B9/027;B08B7/00;B44C1/22;C23G5/00;H01J37/32;H01L21/3065;H01L21/311;H05H1/00 |
主分类号 |
B08B9/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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