发明名称 Plasma Generation Method, Cleaning Method, and Substrate Processing Method
摘要 A plasma generation method in a toroidal plasma generator that includes a gas passage having a gas entrance and a gas outlet and forming a circuitous path and a coil wound around a part of the gas passage includes the steps of supplying a mixed gas of an Ar gas and an NF3 gas containing at least 5% of NF3 and igniting plasma by driving the coil with a high-frequency power, wherein the plasma ignition step is conducted under a total pressure of 6.65-66.5 Pa.
申请公布号 US2010252068(A1) 申请公布日期 2010.10.07
申请号 US20100752813 申请日期 2010.04.01
申请人 TOKYO ELECTRON LIMITED 发明人 KANNAN HIROSHI;TAMURA NOBORU;DOBASHI KAZUYA
分类号 B08B9/027;B08B7/00;B44C1/22;C23G5/00;H01J37/32;H01L21/3065;H01L21/311;H05H1/00 主分类号 B08B9/027
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